✦ LIBER ✦

Analysis of Rb and Cs implantations in silicon by channeling and hall effect measurements

✍ Scribed by O. Meyer; J.W. Mayer

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Analysis of Rb and Cs implantations in s

📂 Article 📅 1971 🏛 Elsevier Science 🌐 English ⚖ 114 KB

RBS and channelling analysis of As and G

✍ R. Berger; F. Rudolf; C. Jaccard; M.E. Roulet; W. Lüthy; M.R.T. Siregar; H.P. We 📂 Article 📅 1980 🏛 Elsevier Science ⚖ 360 KB

Analysis of anodically oxidized InP by M

✍ R.J. Wagner; S.S. Lau; R.P. Küllen; D.L. Lile; N.K. Wagner 📂 Article 📅 1978 🏛 Elsevier Science ⚖ 298 KB

Tellurium and iodine in silicon part II:

📂 Article 📅 1985 🏛 Elsevier Science 🌐 English ⚖ 173 KB

Carrier and mobility profile measurement

✍ R. Nipoti; D. Pocci; A. Cetronio; C. Lanzieri 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 336 KB

Investigation of carrier scattering mech

✍ A. F. Qasrawi; N. M. Gasanly 📂 Article 📅 2004 🏛 John Wiley and Sons 🌐 English ⚖ 478 KB 👁 2 views