Analysis of Rb and Cs implantations in silicon by channeling and Hall effect measurements : O. Meyer and J. W. Mayer, Solid-State Electron.13 (1970), p. 1357

• Publisher: Elsevier Science
• Year: 1971
• Tongue: English
• Weight: 114 KB
• Volume: 10
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(71)90556-7