Tellurium and iodine in silicon part II: Hall effect and resistivity measurements on ion implanted silicon: G J Kemerink et al,Rad Effects, 69 (1/2), 1983, 101–112.

• Publisher: Elsevier Science
• Year: 1985
• Tongue: English
• Weight: 173 KB
• Volume: 35
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(85)90197-6