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Analysis and optimization of the electron cyclotron resonance plasma for nitride epitaxy

โœ Scribed by A. Ohtani; K.S. Stevens; M. Kinniburgh; R. Beresford


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
451 KB
Volume
150
Category
Article
ISSN
0022-0248

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## Abstract Boron nitride (BN) films with high crystallinity and phase purity (>80โ€‰%) in the cubic phase were synthesized over large areas using fluorine chemistry and electronโ€“cyclotron resonance (ECR) microwave plasma. Plasmaโ€enhanced fluorine chemistry was provided by a complex H~2~โ€“BF~3~โ€“N~2~โ€“A