An investigation on p—n junction etch stop

✍ Scribed by Chong-ruo Wu

• Book ID: 103959428
• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 640 KB
• Volume: 35
• Category: Article
• ISSN: 0924-4247
• DOI: 10.1016/0924-4247(93)80149-b

✦ Synopsis

A p-n Junction etch stop has some advantages over a p+ etch stop and retams all the amsotroplc etchmg charactenstlcs, but it 1s still seldom used m practice This paper describes the current density versus voltage relationship, the etch-stop behavlour, the special technology process, the etch rate m a p-n Junction etch stop and the surface roughness after a p-n Junction etch stop In view of this, the p-n Junction etch stop should become a reliable mlcromachmq technology