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An investigation of structural defects in diamond films grown at low substrate temperatures

✍ Scribed by Stiegler, J; Michler, J; Blank, E

Book ID: 121385354
Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 352 KB
Volume: 8
Category: Article
ISSN: 0925-9635
DOI: 10.1016/S0925-9635(98)00272-6

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## Abstract Nanocrystalline diamond (NCD) films were grown by microwave plasma CVD in hydrogen‐based gas mixture. Deposition experiments were performed at different temperatures varying from 370 to 1100 °C. Before growth step, silicon (100) oriented substrates were nucleated by bias enhanced nuclea