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An electron imaging system for the fabrication of integrated circuits

โœ Scribed by T.W. O'Keeffe; J. Vine; R.M. Handy


Publisher
Elsevier Science
Year
1969
Tongue
English
Weight
522 KB
Volume
12
Category
Article
ISSN
0038-1101

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Ane electron beam system to fabricate in
โœ Stephen J. Angello ๐Ÿ“‚ Article ๐Ÿ“… 1973 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 804 KB

The tzaxmnnk of integraled circuits makea it likely that th hi&& pmibls circzlit densities will be attempted in manufacture. Reueom are g&&n fw the tm of electma beams in&eud of Zigti fw th.e muking procedures in making d&grated &mite. The beet total eye&??3 wiu con&t of two m@w subeysteme. One. wil