Ane electron beam system to fabricate integrated circuits

✍ Scribed by Stephen J. Angello

• Publisher: Elsevier Science
• Year: 1973
• Tongue: English
• Weight: 804 KB
• Volume: 296
• Category: Article
• ISSN: 0016-0032
• DOI: 10.1016/0016-0032(73)90294-9

✦ Synopsis

The tzaxmnnk of integraled circuits makea it likely that th hi&& pmibls circzlit densities will be attempted in manufacture. Reueom are g&&n fw the tm of electma beams in&eud of Zigti fw th.e muking procedures in making d&grated &mite. The beet total eye&??3 wiu con&t of two m@w subeysteme. One. will be a scanning el&ron microecope

(SEM) @ted with ecan wntrol~ and a digital rrscesk geneding capabili$y. The other ia an eledron &wage projection Bystern (ELIPS) to make G&gra&d circuits at economical manu-

factuti?qy r&a. The two eubeyetema are linked by thu fad that tha SEM con&w% the high resolution photocathode fw the ELIPS. PredG.t&m% are made fw future dmeiopm~rcts.