✦ LIBER ✦

An atomic layer deposition process for moving flexible substrates

✍ Scribed by P.S. Maydannik; T.O. Kääriäinen; D.C. Cameron

Book ID: 108084330
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 629 KB
Volume: 171
Category: Article
ISSN: 1385-8947
DOI: 10.1016/j.cej.2011.03.097

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Atomic Layer Deposition of Pd on an Oxid

Atomic Layer Deposition of Pd on an Oxidized Metal Substrate

✍ G. A. Ten Eyck; S. Pimanpang; H. Bakhru; T.-M. Lu; G.-C. Wang 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 270 KB 👁 1 views

Atmospheric Pressure Process for Coating

Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition

✍ Renske Beetstra; Ugo Lafont; John Nijenhuis; Erik M. Kelder; J. Ruud van Ommen 📂 Article 📅 2009 🏛 John Wiley and Sons 🌐 English ⚖ 744 KB

An Algorithm for Inverse Modeling of Lay

An Algorithm for Inverse Modeling of Layer-by-Layer Deposition Processes

✍ S.G. Lambrakos; K.P. Cooper 📂 Article 📅 2009 🏛 Springer US 🌐 English ⚖ 629 KB

Titanium isopropoxide as a precursor for

Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

✍ Jaan Aarik; Aleks Aidla; Teet Uustare; Mikko Ritala; Markku Leskelä 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 208 KB

Atomic layer deposition ALD of titanium oxide from titanium isopropoxide Ti OCH CH and water as well as 3 2 4 Ž Ž . . Ž . from Ti OCH CH and hydrogen peroxide H O was studied. According to data of real-time quartz crystal 3 2 4 2 2 Ž . Ž Ž . . microbalance QCM measurements, adsorption of Ti OCH CH w

Atomic layer deposition process with TiF

Atomic layer deposition process with TiF_4 as a precursor for depositing metal fluoride thin films

✍ Pilvi, Tero ;Ritala, Mikko ;Leskelä, Markku ;Bischoff, Martin ;Kaiser, Ute ;Kais 📂 Article 📅 2008 🏛 The Optical Society 🌐 English ⚖ 618 KB

Atomic layer deposition of TiO2 and Al-d

Atomic layer deposition of TiO2 and Al-doped TiO2 films on Ir substrates for ultralow leakage currents

✍ Seong Keun Kim; Sora Han; Jeong Hwan Han; Woongkyu Lee; Cheol Seong Hwang 📂 Article 📅 2011 🏛 John Wiley and Sons 🌐 English ⚖ 267 KB