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[American Vacuum Soc 2001 6th International Symposium on Plasma- and Process-Induced Damage - Monterey, CA, USA (13-15 May 2001)] 2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538) - Plasma charging damage issues in copper single and dual damascene, oxide and low-k dielectric interconnects

โœ Scribed by Van den Bosch, G.; De Jaeger, B.; Tokei, Z.; Groeseneken, G.


Book ID
121314868
Publisher
American Vacuum Soc
Year
2001
Weight
488 KB
Category
Article
ISBN-13
9780965157759

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