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[American Vacuum Soc 2001 6th International Symposium on Plasma- and Process-Induced Damage - Monterey, CA, USA (13-15 May 2001)] 2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538) - Plasma charging damage issues in copper single and dual damascene, oxide and low-k dielectric interconnects

✍ Scribed by Van den Bosch, G.; De Jaeger, B.; Tokei, Z.; Groeseneken, G.

Book ID: 121314868
Publisher: American Vacuum Soc
Year: 2001
Weight: 488 KB
Category: Article
ISBN-13: 9780965157759
DOI: 10.1109/PPID.2001.929966

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