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AFM and STM studies on In2O3 and ITO thin films deposited by atomic layer epitaxy

✍ Scribed by Timo Asikainen; Mikko Ritala; Markku Leskelä; Thomas Prohaska; Gernot Friedbacher; Manfred Grasserbauer


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
636 KB
Volume
99
Category
Article
ISSN
0169-4332

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Oxide 5lms in the ZnO+In 2 O 3 and ZnO+tin-doped indium oxide (ITO) systems were deposited by simultaneous dc sputtering of ZnO and In 2 O 3 or ITO facing targets at substrate temperatures from room temperature up to 3003C. The ratio of the ZnO target current to the sum of both the currents was vari