𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Adhesion improvements in silicon carbide deposited by plasma enhanced chemical vapour deposition

✍ Scribed by V.A. Mernagh; T.C. Kelly; M. Ahern; A.D. Kennedy; A.P.M. Adriaansen; P.P.J. Ramaekers; L. McDonnell; R. Koekoek


Book ID
107930136
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
609 KB
Volume
49
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Preparation of hydrogenated amorphous si
✍ J Huran; J Ε afrΓ‘nkovΓ‘; A.P. Kobzev πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 252 KB

Thin silicon carbide (SiCI films were prepared by plasma enhanced chemical vapour deposition PECVDI. The structural properties of Sic films were investigated by IR, RBS, and ERD measurement techniques. The results showed that the films contain the typical features found in hydrogenated amorphous Sic

Stimulated emission in plasma-enhanced c
✍ L. Dal Negro; M. Cazzanelli; N. Daldosso; Z. Gaburro; L. Pavesi; F. Priolo; D. P πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 324 KB

Observation of optical gain in silicon nanocrystals (Si-nc) is critically dependent on a very delicate balance among the Si-nc gain cross-sections, the optical mode losses and conΓΏnement factors of the waveguide structures, the Si-nc concentration and the strongly competing fast non-radiative Auger