Adhesion improvements in silicon carbide deposited by plasma enhanced chemical vapour deposition
β Scribed by V.A. Mernagh; T.C. Kelly; M. Ahern; A.D. Kennedy; A.P.M. Adriaansen; P.P.J. Ramaekers; L. McDonnell; R. Koekoek
- Book ID
- 107930136
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 609 KB
- Volume
- 49
- Category
- Article
- ISSN
- 0257-8972
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π SIMILAR VOLUMES
Thin silicon carbide (SiCI films were prepared by plasma enhanced chemical vapour deposition PECVDI. The structural properties of Sic films were investigated by IR, RBS, and ERD measurement techniques. The results showed that the films contain the typical features found in hydrogenated amorphous Sic
Observation of optical gain in silicon nanocrystals (Si-nc) is critically dependent on a very delicate balance among the Si-nc gain cross-sections, the optical mode losses and conΓΏnement factors of the waveguide structures, the Si-nc concentration and the strongly competing fast non-radiative Auger