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Absolute rate constant and temperature dependence for the reaction of silylene with nitrous oxide

✍ Scribed by R. Becerra; H.M. Frey; B.P. Mason; R. Walsh

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 439 KB
Volume: 185
Category: Article
ISSN: 0009-2614
DOI: 10.1016/0009-2614(91)80234-o

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✦ Synopsis

Absolute rate constants hav-e been measured for the reaction of SiH, with N,O at temperatures between 295-747 K. The rate constantsarefittedto the Arrheniusequation: log( k/cm' molecule-' s-l) = ( -12.09+0.04) t (2.02?0.31) kJ mol-'JRTln IO.

The data are plausibly consistent with a mechanism involving a short-lived H,BON2 addition complex leading to formation of H,SiO+N2. Comparisons are made with other silylene reactions. The fate and stability of HzSiO are briefly discussed. The significance of these measurements for the kinetic modelling of the chemical vapour deposition of silicon oxide from silane/N,O mixtures is also commented on.

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