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A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's

โœ Scribed by Hao Guan; Ming-Fu Li; Yandong He; Byung Jin Cho; Zhong Dong


Book ID
114538255
Publisher
IEEE
Year
2000
Tongue
English
Weight
188 KB
Volume
47
Category
Article
ISSN
0018-9383

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