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A study of ultra-shallow implanted dopant profiles in silicon using BC and MD simulations

✍ Scribed by Hobler, G.; Fehlmann, G.

Book ID: 126921565
Publisher: Taylor and Francis Group
Year: 1997
Tongue: English
Weight: 561 KB
Volume: 141
Category: Article
ISSN: 1042-0150
DOI: 10.1080/10420159708211562

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