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Simulations of arsenic and boron co-implanted in silicon during RTA for ultra-shallow junctions realizations

✍ Scribed by A. Merabet

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 247 KB
Volume: 124-125
Category: Article
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2005.08.021

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