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A study of silicon oxides prepared by oxygen implantation into silicon

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📜 SIMILAR VOLUMES

Characterization of silicon oxynitride f

✍ R. Hezel; W. Streb 📂 Article 📅 1985 🏛 Elsevier Science 🌐 English ⚖ 347 KB

Properties of SiO2 films formed by oxyge

✍ K.I. Kirov; E.D. Atanasova; S.P. Alexandrova; B.G. Amov; A.E. Djakov 📂 Article 📅 1978 🏛 Elsevier Science 🌐 English ⚖ 264 KB

A model for the oxidation of silicon by

✍ H.U. Jäger; E. Hensel; U. Kreissig; W. Skorupa; E. Sobeslavsky 📂 Article 📅 1985 🏛 Elsevier Science 🌐 English ⚖ 614 KB

XPS studies of SiO2 surface layers forme

✍ Schulze, D. ;Finster, J. ;Hensel, E. ;Skorupa, W. ;Kreissig, U. 📂 Article 📅 1983 🏛 John Wiley and Sons 🌐 English ⚖ 203 KB

Properties of SOI structures formed by h

✍ Lu Diantong; Lu Wuxing; Wang Zhonglie; Du Yongchang; Zheng Huaide; Mo Dang; Lian 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 264 KB

Molecular dynamics study of B18H22 clust

✍ Luis A. Marqués; Lourdes Pelaz; Iván Santos 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 833 KB