A novel liquid photo-polymerization resist was prepared for nanoimprint lithography on transparent flexible plastic substrates. The resist is a mixture of polymethylmethacrylate (PMMA), methylmethacrylate (MMA), methacylic acid (MAA) and two photo-initiators, (2-isopropyl thioxanthone (ITX) and ethy
A study of resist flow during nanoimprint lithography
β Scribed by D.S. Macintyre; S. Thoms
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 387 KB
- Volume
- 78-79
- Category
- Article
- ISSN
- 0167-9317
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