✦ LIBER ✦
Evaluation of a novolak based positive tone photoresist as NanoImprint Lithography resist
✍ Scribed by Alessandro Pozzato; Gianluca Grenci; Giovanni Birarda; Massimo Tormen
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 486 KB
- Volume
- 88
- Category
- Article
- ISSN
- 0167-9317
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