Stamp replication for thermal and UV nanoimprint lithography using a UV-sensitive silsesquioxane resist

✍ Scribed by N. Kehagias; V. Reboud; J. De Girolamo; M. Chouiki; M. Zelsmann; J. Boussey; C.M. Sotomayor Torres

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 318 KB
• Volume: 86
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2009.01.052