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A study comparing measurements of roughness of silicon and SiO2 surfaces and interfaces using scanning probe microscopy and neutron reflectivity

โœ Scribed by A. Crossley; C.J. Sofield; J.P. Goff; A.C.I. Lake; M.T. Hutchings; A. Menelle


Book ID
115990430
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
562 KB
Volume
187
Category
Article
ISSN
0022-3093

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A critical comparison of several techniques for the evaluation of imperfections in sificon-onsapphire (SOS) wafers leads to the adoption of a model of the SOS surface based on an effective medium approximation treatment of the ellipsometric" results.