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Characterisation of rough silicon surfaces using spectroscopic ellipsometry, reflectance, scanning electron microscopy and scattering measurements

✍ Scribed by C. Pickering; R. Greef; A.M. Hodge


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
423 KB
Volume
5
Category
Article
ISSN
0921-5107

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✦ Synopsis


A critical comparison of several techniques for the evaluation of imperfections in sificon-onsapphire (SOS) wafers leads to the adoption of a model of the SOS surface based on an effective medium approximation treatment of the ellipsometric" results.