Simulated annealing is proposed as a simulation method for single-electron tunnel devices and circuits. Tunnel junctions, voltage sources and capacitors are used as elements for the construction of single-electron circuits. The simulator is applied successfully to the twostage tunnel junction invert
A single-electron device and circuit simulator
β Scribed by Christoph Wasshuber; Hans Kosina
- Publisher
- Elsevier Science
- Year
- 1997
- Tongue
- English
- Weight
- 135 KB
- Volume
- 21
- Category
- Article
- ISSN
- 0749-6036
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β¦ Synopsis
We introduce a single-electron device and circuit simulator, called SIMON, with the following features. Tunnel junctions, capacitors, constant voltage sources, piecewise-linear time-dependent voltage sources and voltage controlled voltage sources can be connected arbitrarily to form a single-electron device or circuit. With various parameters one controls transient and stationary simulation modes. All node voltages, node charges and currents in any branch of the network can be output to files for later post-processing. The tunnelling of single electrons is simulated with a Monte Carlo technique where the change in free energy of the whole network determines tunnel rates of possible tunnel events.
π SIMILAR VOLUMES
Multiple-valued logic devices can be constructed compactly by utilizing quantized behavior of single-electron circuits. As an example, a single-electron multiple-valued Hopfield network solving optimization problems is designed. Computer simulation shows that the network can successfully converge to
## Abstract A circuit theory for metallic singleβelectron tunnelling (SET) junctions is presented. In detail circuits with a single SET junction in arbitrary environments are described. Based on the conservation of energy in the circuitsβa fundamental circuit theoremβequivalent circuit elements are