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a-Si:H thin film microstructure influenced by HOMOCVD-process parameters

โœ Scribed by A. Toneva; Bl. Pantchev; P. Danesh


Book ID
103965026
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
314 KB
Volume
31
Category
Article
ISSN
0927-0248

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Titanium containing amorphous carbon (TiC/a-C:H) films were deposited by a hybrid IPVD/PECVD (Ionized Physical Vapor Deposition/Plasma Enhanced Chemical Vapor Deposition) process combining titanium target magnetron sputtering and PECVD in an Ar-CH 4 plasma. Films with various carbon contents have be