Effect of the gas pressure during deposition on the optical properties of HOMOCVD a-Si:H thin films
β Scribed by Tzv. Mihailova; A. Toneva
- Book ID
- 108029151
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 367 KB
- Volume
- 36
- Category
- Article
- ISSN
- 0927-0248
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The in uence of the thickness of the a-Si : H ΓΏlm on its optical properties was studied using spectrophotometric measurements of the ΓΏlm transmittance and re ectance in the wavelength range 200 -3000 nm. Both the refractive index and the absorption coe cient were found to increase as the ΓΏlm thickne
Conductivity and photoconductivity measurements of hydrogenated amorphous silicon (a-Si : H) prepared by homogeneous chemical vapor deposition (HOMOCVD) are reported. The conductivity activation energy (E a) has been varied by changing the substrate temperature. It was found that the conductivity of