𝔖 Bobbio Scriptorium
✦   LIBER   ✦

A reactive ion beam etching and coating system

✍ Scribed by Yuchun Zhang; Yuming Wu; Congxin Ren; Xinding Fu; Guoming Chen


Book ID
113277364
Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
486 KB
Volume
6
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Reactive ion beam etching characteristic
✍ Ren Congxin; Yang Jie; Zheng Yanfang; Chen Lizhi; Chen Guoliang; Tsou Shichang πŸ“‚ Article πŸ“… 1987 πŸ› Elsevier Science 🌐 English βš– 962 KB
Electron-beam-induced current and atomic
✍ G. JΓ€ger-Waldau; H.-U. Habermeier; G. Zwicker; E. Bucher πŸ“‚ Article πŸ“… 1994 πŸ› Elsevier Science 🌐 English βš– 278 KB

Reactive ion etching and reactive ion beam etching are common anisotropic etch processes in silicon microdevice fabrication. Unfortunately, they are also known to create electrically active defects in the bulk material. It is possible to detect these active defects with the electron-beam-induced cur

Deep reactive ion etching and focused io
✍ G. Villanueva; J.A. Plaza; A. SΓ‘nchez-Amores; J. Bausells; E. MartΓ­nez; J. Samit πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 281 KB

We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a