A reactive ion beam etching and coating system
β Scribed by Yuchun Zhang; Yuming Wu; Congxin Ren; Xinding Fu; Guoming Chen
- Book ID
- 113277364
- Publisher
- Elsevier Science
- Year
- 1985
- Tongue
- English
- Weight
- 486 KB
- Volume
- 6
- Category
- Article
- ISSN
- 0168-583X
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Reactive ion etching and reactive ion beam etching are common anisotropic etch processes in silicon microdevice fabrication. Unfortunately, they are also known to create electrically active defects in the bulk material. It is possible to detect these active defects with the electron-beam-induced cur
We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a