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A pulsed synthesis of β-FeSi2layers on silicon implanted with Fe+ions

✍ Scribed by R. I. Batalov; R. M. Bayazitov; E. I. Terukov; V. Kh. Kudoyarova; G. Weiser; H. Kuehne

Book ID: 110128533
Publisher: Springer
Year: 2001
Tongue: English
Weight: 88 KB
Volume: 35
Category: Article
ISSN: 1063-7826
DOI: 10.1134/1.1418069

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## Abstract We propose an original approach called “stencil‐masked ion implantation process” to perform a spatially localized synthesis of a limited number of Si nanoparticles (nps) within a thin SiO~2~ layer. This process consists in implanting silicon ions at ultra‐low energy through a stencil ma