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A Powerful Soft X-ray Source for X-ray Lithography Based on Plasma Focusing

✍ Scribed by Bogolyubov, E P; Bochkov, V D; Veretennikov, V A; Vekhoreva, L T; Gribkov, V A; Dubrovskii, A V; Ivanov, Yu P; Isakov, A I; Krokhin, O N; Lee, P; Lee, S; Nikulin, V Ya; Serban, A; Silin, P V; Feng, X; Zhang, G X

Book ID: 125459205
Publisher: Royal Swedish Academy of Sciences
Year: 1998
Tongue: English
Weight: 173 KB
Volume: 57
Category: Article
ISSN: 0031-8949
DOI: 10.1088/0031-8949/57/4/003

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