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A Novel Process to Improve the Surface Roughness of RuO[sub 2] Film Deposited by Metallorganic Chemical Vapor Deposition

✍ Scribed by Park, Sung-Eon

Book ID: 124096084
Publisher: The Electrochemical Society
Year: 1999
Tongue: English
Weight: 286 KB
Volume: 1
Category: Article
ISSN: 1099-0062
DOI: 10.1149/1.1390706

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