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A novel hierarchical approach for proximity effect correction in electron beam lithography

โœ Scribed by Harafuji, K.; Misaka, A.; Nomura, N.; Kawamoto, M.; Yamashita, H.


Book ID
118161054
Publisher
IEEE
Year
1993
Tongue
English
Weight
733 KB
Volume
12
Category
Article
ISSN
0278-0070

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