A VLSI memory cell is proposed that offers high immunity to alpha-particle-induced soft errors and a cell area comparable to a one-transistor memory cell. This memory cell consists of a pair of complementary MOSFETs and one capacitor. The PMOSFET is formed in an SOI film over the NMOSFET. Since both
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A new soft-error-immune DRAM cell using a stacked CMOS structure
β Scribed by Terada, K.; Kurosawa, S.; Takeshima, T.
- Book ID
- 114596014
- Publisher
- IEEE
- Year
- 1987
- Tongue
- English
- Weight
- 628 KB
- Volume
- 34
- Category
- Article
- ISSN
- 0018-9383
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