✦ LIBER ✦

A new SILO process for VLSI isolation using N2+ ion implantation

✍ Scribed by Duan Li; Li Weizhong; Wang Yong; Lin Yufeng

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

A new SILO process for VLSI isolation us

📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 140 KB

A new multi-layer ion implantation model

✍ D. Pantić; S. Mijalković; N. Stojadinović 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 316 KB

A vacuum exchange end station for a new

✍ R. Hertel; A. Freytsis; E. Mears; A. Delforge 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 440 KB

A new process using a redox type of ion

✍ K. Tanihara 📂 Article 📅 1994 🏛 Springer 🌐 English ⚖ 522 KB

A new etching method for single-crystal

✍ Makoto Ishida; Hoon Kim; Takayuki Kimura; Tetsuro Nakamura 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 533 KB

A new multi-layer ion implantation model

📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 110 KB