A new SILO process for VLSI isolation using N2+ ion implantation : Duan Li, Li Weizhong, Wang Yong and Lin Yufeng. Vacuum 39(2–4), 211 (1989)

• Book ID: 103282878
• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 140 KB
• Volume: 30
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(90)90150-l