✦ LIBER ✦

A New Negative-Type Photosensitive Polyimide Based on Poly(hydroxyimide), a Cross-Linker, and a Photoacid Generator

✍ Scribed by Ueda, Mitsuru; Nakayama, Tomonari

Book ID: 126035010
Publisher: American Chemical Society
Year: 1996
Tongue: English
Weight: 254 KB
Volume: 29
Category: Article
ISSN: 0024-9297
DOI: 10.1021/ma9605560

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

A Negative-Type Photosensitive Poly(3-he

A Negative-Type Photosensitive Poly(3-hexylthiophene) with Cross-Linker and Photoacid Generator

✍ Endo, Keita; Ogura, Tomohito; Higashihara, Tomoya; Ueda, Mitsuru 📂 Article 📅 2009 🏛 Nature Publishing Group 🌐 English ⚖ 106 KB

A Negative Type Photosensitive Polymer B

A Negative Type Photosensitive Polymer Based on Poly(naphthylene ether), a Cross-Linker, and a Photoacid Generator with Low Dielectric Constant

✍ Tsuchiya, Kousuke; Shibasaki, Yuji; Ueda, Mitsuru 📂 Article 📅 2007 🏛 Nature Publishing Group 🌐 English ⚖ 173 KB

Alkaline-developable, chemically amplifi

Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator

✍ Yuta Saito; Katsuhisa Mizoguchi; Tomoya Higashihara; Mitsuru Ueda 📂 Article 📅 2009 🏛 John Wiley and Sons 🌐 English ⚖ 226 KB 👁 1 views

## Abstract A chemically amplified photosensitive polyimide based on polyhydroxyimide (PHI) from cyclobutanetetracarboxylic dianhydride and 4,4′‐(hexafluoroisopropylidene)bis(2‐aminophenol), 4,4′‐methylenebis[2,6‐bis(hydroxymethyl)phenol] (MBHP) as a crosslinker, and (5‐propylsulfonyloxyimino‐5__H_

Three-Component Negative-Type Photoresis

Three-Component Negative-Type Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator

✍ Ueda, Mitsuru; Takahashi, Daisuke; Nakayama, Tomonari; Haba, Osamu 📂 Article 📅 1998 🏛 American Chemical Society 🌐 English ⚖ 220 KB

A New Positive-Type Photosensitive Alkal

A New Positive-Type Photosensitive Alkaline-Developable Alicyclic Polyimide Based on Poly(amic acid silylester) as a Polyimide Precursor and Diazonaphthoquinone as a Photosensitive Compound

✍ Watanabe, Yasufumi; Shibasaki, Yuji; Ando, Shinji; Ueda, Mitsuru 📂 Article 📅 2002 🏛 American Chemical Society 🌐 English ⚖ 92 KB

ChemInform Abstract: A New Three-Compone

ChemInform Abstract: A New Three-Component Photoresist Based on Calix[4]resorcinarene Derivative, a Cross-Linker, and a Photo-Acid Generator

✍ Tomonari Nakayama; Masayoshi Nomura; Kohji Haga; Mitsuru Ueda 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 28 KB