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A New Positive-Type Photosensitive Alkaline-Developable Alicyclic Polyimide Based on Poly(amic acid silylester) as a Polyimide Precursor and Diazonaphthoquinone as a Photosensitive Compound

โœ Scribed by Watanabe, Yasufumi; Shibasaki, Yuji; Ando, Shinji; Ueda, Mitsuru

Book ID
125959257
Publisher
American Chemical Society
Year
2002
Tongue
English
Weight
92 KB
Volume
14
Category
Article
ISSN
0897-4756

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๐Ÿ“œ SIMILAR VOLUMES

A positive-working photosensitive alkali
A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound
โœ H. Seino; A. Mochizuki; O. Haba; M. Ueda ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 57 KB ๐Ÿ‘ 2 views

The contrast was misreported in the original article. The correct contrast is 2.3, not 7.8, as first stated.

A positive-working photosensitive alkali
A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound
โœ Hiroshi Seino; Amane Mochizuki; Osamu Haba; Mitsuru Ueda ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 212 KB ๐Ÿ‘ 2 views

A positive-working photosensitive polyimide precursor based on fluorinated poly(amic acid) (FPAA) and 2,3,4-tris(1-oxo-2-diazonaphthoquinon-4-ylsulfonyloxy-)benzophenone (D4SB) as a photosensitive compound has been developed. FPAA was prepared by ring-opening polyaddition of dianhydrides, pyromellit