Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator
✍ Scribed by Yuta Saito; Katsuhisa Mizoguchi; Tomoya Higashihara; Mitsuru Ueda
- Publisher
- John Wiley and Sons
- Year
- 2009
- Tongue
- English
- Weight
- 226 KB
- Volume
- 113
- Category
- Article
- ISSN
- 0021-8995
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✦ Synopsis
Abstract
A chemically amplified photosensitive polyimide based on polyhydroxyimide (PHI) from cyclobutanetetracarboxylic dianhydride and 4,4′‐(hexafluoroisopropylidene)bis(2‐aminophenol), 4,4′‐methylenebis[2,6‐bis(hydroxymethyl)phenol] (MBHP) as a crosslinker, and (5‐propylsulfonyloxyimino‐5__H__‐thiophen‐2‐ylidene)‐(2‐methylphenyl)acetonitrile (PTMA) as a photoacid generator was developed to obtain the abilities of low temperature patterning, low dielectric constant, and high sensitivity. The chemically amplified photosensitive polyimide, consisting of PHI (70 wt %), MBHP (20 wt %), and PTMA (10 wt %), showed a high sensitivity (D~0.5~) of 5.9 mJ/cm^2^ and a good contrast (γ~0.5~) of 3.9, respectively, producing a clear negative‐tone line‐and‐space pattern with 6‐μm resolution. Furthermore, the chemically amplified photosensitive polyimide showed a high transparency in the i‐line region and a low dielectric constant of 2.54. © 2009 Wiley Periodicals, Inc. J Appl Polym Sci, 2009