✦ LIBER ✦

A new media and concept of direct writing patterns by electron beam

✍ Scribed by G.V. Saparin; S.K. Obyden; M.V. Chukhichev; S.I. Popov

Book ID: 107920260
Publisher: Elsevier Science
Year: 1983
Tongue: English
Weight: 248 KB
Volume: 1
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(83)90028-x

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Direct Writing of Patterned Ceramics Usi

Direct Writing of Patterned Ceramics Using Electron-Beam Lithography and Metallopolymer Resists

✍ S. B. Clendenning; S. Aouba; M. S. Rayat; D. Grozea; J. B. Sorge; P. M. Broderse 📂 Article 📅 2004 🏛 John Wiley and Sons 🌐 English ⚖ 263 KB

Characterization of benzocyclobutene opt

Characterization of benzocyclobutene optical waveguides fabricated by electron-beam direct writing

✍ Chih-Wei Hsu; Hsuen-Li Chen; Wen-Chi Chao; Way-Seen Wang 📂 Article 📅 2004 🏛 John Wiley and Sons 🌐 English ⚖ 86 KB

## Abstract Optical waveguides based on benzocyclobutene polymer are fabricated by electron‐beam direct writing without etching. The propagation losses of waveguide measured at 1.55 μm for both TE and TM polarizations are 0.76 and 0.86 dB/cm, respectively. Moreover, the characteristics of waveguide

The Direct Writing of Plasmonic Gold Nan

The Direct Writing of Plasmonic Gold Nanostructures by Electron-Beam-Induced Deposition

✍ Katja Höflich; Ren Bin Yang; Andreas Berger; Gerd Leuchs; Silke Christiansen 📂 Article 📅 2011 🏛 John Wiley and Sons 🌐 English ⚖ 311 KB

Simultaneous exposure of filter gratings

Simultaneous exposure of filter gratings and waveguides by direct write electron-beam lithography

✍ R. Steingrüber; M. Hamacher 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 347 KB

Patterning of a Ti/Pt/Au metallization f

Patterning of a Ti/Pt/Au metallization for submicron bipolar transistors made by direct write e-beam lithography

✍ M.N. Webster; A.H. Verbruggen; H.F.F. Jos; J. Romijn; P.M.A. Moors; S. Radelaar 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 417 KB

Direct Sub-Micrometer-Patterning of Conj

Direct Sub-Micrometer-Patterning of Conjugated Polymers and Polymer Light-Emitting Devices by Electron Beam Lithography

✍ Evelin Fisslthaler; Meltem Sezen; Harald Plank; Alexander Blümel; Stefan Sax; We 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 446 KB

## Abstract The lateral pattering of polymer light emitting devices (PLEDs) on the micro‐ and even sub‐micrometer level is a challenging task. Being able to fabricate devices with sub‐micrometer active device dimensions will, however, open new possibilities for fundamental studies as well as enable