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A new, laminar flow photo-CVD method for preparing hydrogenated amorphous silicon films

✍ Scribed by Akihiko Furukawa; Yoshinori Iida; Tetsuya Yamaguchi; Nozomu Harada; Hidetoshi Nozaki; Takaaki Kamimura; Kensaku Yano; Hiroshi Ito; Katsuya Okumura

Book ID: 117147083
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 229 KB
Volume: 137-138
Category: Article
ISSN: 0022-3093
DOI: 10.1016/s0022-3093(05)80208-x

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