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Hydrogenated amorphous silicon films prepared at low substrate temperature on a cathode of an asymmetric r.f. plasma CVD system

✍ Scribed by Tanay Seth; P.N. Dixit; C. Mukherjee; C. Anandan; R. Bhattacharyya


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
743 KB
Volume
264
Category
Article
ISSN
0040-6090

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