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Characteristics of a-Si:H films prepared by a novel laminar flow photo-chemical vapor deposition method

✍ Scribed by Tetsuya Yamaguchi; Yoshinori Iida; Akihiko Furukawa; Yoshiki Ishizuka; Hidetoshi Nozaki; Sohei Manabe; Hiroyuki Tango; Okio Yoshida

No coin nor oath required. For personal study only.

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