Narrow band gap, high photosensitivity a-SiGe:H films prepared by hot wire chemical vapor deposition (HW-CVD) method

✍ Scribed by S.R Jadkar; J.V Sali; S.T Kshirsagar; M.G Takwale

• Book ID: 117356549
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 79 KB
• Volume: 52
• Category: Article
• ISSN: 0167-577X
• DOI: 10.1016/s0167-577x(01)00430-x