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A model of high-and low-temperature phosphorus diffusion in silicon by a dual pair mechanism

✍ Scribed by O. V. Aleksandrov

Book ID: 110128527
Publisher: Springer
Year: 2001
Tongue: English
Weight: 123 KB
Volume: 35
Category: Article
ISSN: 1063-7826
DOI: 10.1134/1.1418063

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