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The low-temperature doping of silicon by radiation-induced diffusion

✍ Scribed by Koifman, A. I. ;Narkulov, A. N. ;Oksengendler, B. L. ;Yunusov, M. S.

Book ID: 105371928
Publisher: John Wiley and Sons
Year: 1976
Tongue: English
Weight: 422 KB
Volume: 38
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2210380203

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