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Anisotropic etching of silicon nitride at low temperatures by synchrotron radiation

✍ Scribed by Osama Kitamura; Takashi Goto; Shingo Terakado; Shigeo Suzuki; Tetsuji Sekitani; Kenichiro Tanaka

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 640 KB
Volume: 79-80
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(94)90399-9

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