𝔖 Bobbio Scriptorium
✦   LIBER   ✦

A model for low pressure chemical vapor deposition in a hot-wall tubular reactor

✍ Scribed by W.G. Houf; J.F. Grcar; W.G. Breiland

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
827 KB
Volume
17
Category
Article
ISSN
0921-5107

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Kinetic model of low pressure film depos
Kinetic model of low pressure film deposition from single precursor vapor in a well-mixed, cold-wall reactor
✍ S. Krumdieck πŸ“‚ Article πŸ“… 2001 πŸ› Elsevier Science 🌐 English βš– 153 KB

A phenomenological model was derived to describe the deposition kinetics of oxide film growth from thermally activated decomposition of vapor precursor on a heated surface at low pressure. A Langmuir derivation of mass balance on the growing film surface with surface saturation condition was used to