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A low temperature study of electron transport properties of tantalum nitride thin films prepared by ion beam assisted deposition

✍ Scribed by K. Lal; P. Ghosh; D. Biswas; A.K. Meikap; S.K. Chattopadhyay; S.K. Chatterjee; M. Ghosh; K. Baba; R. Hatada

Book ID: 108269285
Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 156 KB
Volume: 131
Category: Article
ISSN: 0038-1098
DOI: 10.1016/j.ssc.2004.05.003

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