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A liquid-xenon-jet laser-plasma x-ray and EUV source

โœ Scribed by B.A.M. Hansson; L. Rymell; M. Berglund; H.M. Hertz

Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
275 KB
Volume
53
Category
Article
ISSN
0167-9317

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โœฆ Synopsis

We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The source is suitable for extreme ultraviolet (EUV) projection lithography and proximity x-ray lithography (PXL). Absolute calibrated spectra in the 1-2 nm range and uncalibrated spectra in the 9-15 nm range are obtained using a free-standing transmission grating and a CCD-detector.

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