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A Compact Ultrafast Capillary Discharge for EUV Projection Lithography

โœ Scribed by I. Krisch; P. Choi; J. Larour; M. Favre; J. Rous; C. Leblanc


Book ID
101311428
Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
324 KB
Volume
40
Category
Article
ISSN
0005-8025

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A gas discharged based radiation source
โœ R. Lebert; K. Bergmann; G. Schriever; W. Neff ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 549 KB

A new high repetitive, compact and low cost gas discharge based EUV ,,lamp" has been studied as an alternative to laser-produced plasmas as EUV sources. First results using oxygen in a fast discharge of electrically stored energy around 1 J lead to a conversion efficiency of about 0.1% for the emiss