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[IEEE 2008 IEEE 35th International Conference on Plasma Science (ICOPS) - Karlsruhe, Germany (2008.06.15-2008.06.19)] 2008 IEEE 35th International Conference on Plasma Science - Compact low current X-pinch based EUV source for lithography

✍ Scribed by Hassan, S. M.; Clark, E. L.; Gopal, A.; Minardi, S.; Petridis, C.; Chatzakis, J.; Androulakis, G.; Tatarakis, M.; Baronova, E. O.; Vikhrev, V. V.; Lee, P.

Book ID: 115480618
Publisher: IEEE
Year: 2008
Tongue: English
Weight: 33 KB
Volume: 0
Category: Article
ISBN: 1424419298
DOI: 10.1109/plasma.2008.4590704

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