𝔖 Bobbio Scriptorium

✦ LIBER ✦

548. 150 kV equipment for ion implantation: M Setvak et al, Proc Int Work Conf of Ion Implant in Semicon in Rossendorf, Berlin 1972, 13–21 (in Russian).

Publisher: Elsevier Science
Year: 1974
Tongue: English
Weight: 161 KB
Volume: 24
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(74)92062-4

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508. Investigation of radiation defects

508. Investigation of radiation defects in implanted silicon films: G Goetz et al, Proc Int Work Conf on Ion Implant in Semicon, Rossendorf 1972, 95–100 (in Russian).

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372. Determination of implantation profi

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394. Application of ion implantation for

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